Current students

Please note: This master’s thesis presentation will be given online.

Sheik Shameer, Master’s candidate
David R. Cheriton School of Computer Science

Supervisor: Professor Mei Nagappan

Tuesday, April 6, 2021 12:00 pm - 12:00 pm EDT (GMT -04:00)

Seminar • Machine Learning — Towards Unsupervised 3D Deep Learning

Please note: This seminar will be given online.

Andrea Tagliasacchi, Research Scientist
Google Brain

It is not uncommon to think of computer graphics and computer vision as loosely disconnected disciplines; the former dealing with the synthesis of visual phenomena and the latter with analysis. However, recent advances in deep learning have blurred the boundary between the two. As a consequence, the research path to develop algorithms that effectively interpret the 3D scene “behind” an image has never seemed so well within reach.

Please note: This PhD seminar will be given online.

Charupriya Sharma, PhD candidate
David R. Cheriton School of Computer Science

Supervisor: Professor Peter van Beek

Please note: This master’s thesis presentation will be given online.

Alexander Van de Kleut, Master’s candidate
David R. Cheriton School of Computer Science

Supervisor: Professor Jeff Orchard

Please note: This master’s thesis presentation will be given online.

MohammadReza Karegar, Master’s candidate
David R. Cheriton School of Computer Science

Supervisor: Professor Lukasz Golab

Computer science students were among the finalists at Concept’s $5K pitch competition, an event held live but virtually on March 26, 2021.

Concept is Velocity’s experiential entrepreneurship and pre-incubator program at the University of Waterloo. Acting as a resource to students interested in entrepreneurship, Concept guides them on how to propel their start-up through programs, coaching and grant-funding opportunities.  

Please note: This master’s thesis presentation will be given online.

Clara Kang, Master’s candidate
David R. Cheriton School of Computer Science

Supervisor: Professor Craig Kaplan

Symmetric patterns are used widely in clothing manufacture. However, the discontinuity of patterns at seams can disrupt the visual appeal of clothing. While it is possible to align patterns to conceal such pattern breaks, it is hard to create a completely seamless garment in terms of pattern continuity.